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Organisation
ISNI: 
0000 0001 2189 753X
Name: 
Japan Society for Applied Physics
Japan Society of Applied Physics
Japanese Society of Applied Physics
JSAP.
Koeki Shadan Hojin Oyo Butsuri Gakkai
Ōbutsu
Ōyō-Butsuri-Gakkai
Oyo Butsuri Gakkai (Tokio, Japonia)
Ōyō Butsurigakkai
Society of Applied Physics Nihon
応用物理学会
Location / Nationality: 
Japan Tôkyô [Tokyo] Bunkyo-ku
Creation class: 
Language material
Creation role: 
originator
Related names: 
Ōyō Butsuri Danwakai (see also from)
Oyo Butsuri Danwakai (Tokio, Japonia) (see also from)
Titles: 
APEX
Applied physics express.
IEEE Symposium on VLSI Circuits
International Conference on Simulation of Semiconductor Processes and Devices.
J S A P international
Japan Society of Applied Physics international
Japanese journal of applied physics.
japanische institutionen
Jiki tokusei dēta.
JJAP.
Journal of applied physics, Japan
Jpn. j. appl. phys., Pt. 1
JSAP international
JSAPI
Kōgaku (Ōyō Butsuri Gakkai)
Letters and express letters
MicroProcess 90 : proceedings of the 1990 International MicroProcess Conference, July 16-19, 1990, Chiba, Japan
Microprocesses and Nanotechnology 2000 : digest of papers : 2000 International Microprocesses and Nanotechnology Conference : July 11-13, 2000, Tokyo, Japan
Microprocesses and nanotechnology 2001 : 2001 International Microprocesses and Nanotechnology Conference, October 31-November 2, 2001, Shimane, Japan : digest of papers
Microprocesses and nanotechnology 2003 : 2003 International Microprocesses and Nanotechnology Conference : October 29-31, 2003, Tokyo, Japan : digest of papers
Ōyō butsuri handobukku
oyo butsuri showa 21 nen 12 gatsu
Ōyō butsuri yōgo daijiten
P²ID
Pacific Rim Conference on Lasers and Electro-Optics
Papers from the International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces (BANPIS '97) : 26-27 January 1997, Nanki Seaside Lodge, Shirahama, Wakayama, Japan
Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan
Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan
Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan
Photomask and X-ray mask technology 4
Photomask and X-ray mask technology four
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan
Plasma- and process-induced damage
Proceedings of First International Conference on Electronic Materials : new materials and new physical phenomena for electronics of the 21st century (ICEM'88), June 13-15, 1988, Shigaku-Kaikan, Tokyo, Japan
Proceedings of the 9th International Conference on Ternary and Multinary Compounds : ICTMC-9 : Yokohama, Japan, August 8-12, 1993
Proceedings of the ... Conference ... International on Solid State Devices
Proceedings of the ... International Conference on High Pressure in Semiconductor Physics.
Proceedings of the ... International Symposium on Exoelectron Emission and Applications.
Proceedings of the International Symposium on Optical Memory : Tokyo, Japan, September 16-17, 1987
Proceedings of the ... Meeting on Ferroelectric Materials and Their Applications.
Proceedings of the ... Photovoltaic Science and Engineering Conference in Japan.
Proceedings of the Sixth International Meeting on Ferroelectricity : 12-16, August 1985, Kobe
Proceedings of the ... Symposium on Ultrasonic Electronics.
Quantum optoelectronics : summaries of papers presented at the Quantum Optoelectronics Topical Meeting : March 11-13, 1991, Salt Lake City Utah
Regular papers and short notes
Regular papers, brief communications and review papers
Regular papers, short notes, and review papers
Simulation of semiconductor processes and devices
SISPAD 2002
SISPAD 2005
SISPAD 2008
SISPAD '99
Solid state devices and materials
Spectral hole-burning and related spectroscopies-- science and applications : summaries of papers presented at the topical meeting ... August 24-26, 1994, Tokyo, Japan
SSDM
Symposium on VLSI Circuits
Symposium on VLSI Technology
Ultrafast phenomena VI : proceedings of the 6th international conference, Mt. Hiei, Kyoto, Japan, July 12-15, 1988
V.L.S.I technology
VLSI technology
アモルファスシリコン
コンパクト版応用物理用語大事典
光ディスクシステム
光学 (Ōyō Butsuri Gakkai)
応用物理.
応用物理ハンドブック
応用物理用語大事典
磁気特性データ.
色の性質と技術
Notes: 
Sources: 
VIAF DNB LC NUKAT